no code implementations • 27 Oct 2022 • Mingjie Liu, HaoYu Yang, Zongyi Li, Kumara Sastry, Saumyadip Mukhopadhyay, Selim Dogru, Anima Anandkumar, David Z. Pan, Brucek Khailany, Haoxing Ren
These synthetic mask images will augment the original limited training dataset used to finetune the lithography model for improved performance.
no code implementations • 8 Jul 2022 • HaoYu Yang, Zongyi Li, Kumara Sastry, Saumyadip Mukhopadhyay, Anima Anandkumar, Brucek Khailany, Vivek Singh, Haoxing Ren
Machine learning techniques have been extensively studied for mask optimization problems, aiming at better mask printability, shorter turnaround time, better mask manufacturability, and so on.
no code implementations • 12 Mar 2022 • HaoYu Yang, Zongyi Li, Kumara Sastry, Saumyadip Mukhopadhyay, Mark Kilgard, Anima Anandkumar, Brucek Khailany, Vivek Singh, Haoxing Ren
Lithography simulation is a critical step in VLSI design and optimization for manufacturability.