no code implementations • 24 Nov 2023 • Yifeng Shao, Sven Weerdenburg, Jacob Seifert, H. Paul Urbach, Allard P. Mosk, Wim Coene
Ptychographic extreme ultraviolet (EUV) diffractive imaging has emerged as a promising candidate for the next-generation metrology solutions in the semiconductor industry, as it can image wafer samples in reflection geometry at the nanoscale.
no code implementations • 18 Oct 2023 • Jacob Seifert, Yifeng Shao, Allard P. Mosk
In this paper, we harness this dimensionality reduction capability of autoencoders to search for the object solution within the latent space rather than the object space.
no code implementations • 3 Aug 2023 • Jacob Seifert, Yifeng Shao, Rens van Dam, Dorian Bouchet, Tristan van Leeuwen, Allard P. Mosk
Optical measurements often exhibit mixed Poisson-Gaussian noise statistics, which hampers image quality, particularly under low signal-to-noise ratio (SNR) conditions.