no code implementations • 25 Mar 2023 • Guojin Chen, HaoYu Yang, Bei Yu
Multiple patterning lithography (MPL) is regarded as one of the most promising ways of overcoming the resolution limitations of conventional optical lithography due to the delay of next-generation lithography technology.
no code implementations • 23 Mar 2023 • Zixiao Wang, Yunheng Shen, Wenqian Zhao, Yang Bai, Guojin Chen, Farzan Farnia, Bei Yu
Deep generative models dominate the existing literature in layout pattern generation.
no code implementations • 18 Mar 2023 • Guojin Chen, Ziyang Yu, Hongduo Liu, Yuzhe ma, Bei Yu
To further enhance printability and fast iterative convergence, we propose a novel deep neural network delicately designed with level set intrinsic principles to facilitate the joint optimization of DNN and GPU accelerated level set optimizer.
no code implementations • 15 Mar 2023 • Guojin Chen, Zehua Pei, HaoYu Yang, Yuzhe ma, Bei Yu, Martin D. F. Wong
Lithography is fundamental to integrated circuit fabrication, necessitating large computation overhead.
no code implementations • 15 Mar 2023 • Wenqian Zhao, Xufeng Yao, Ziyang Yu, Guojin Chen, Yuzhe ma, Bei Yu, Martin D. F. Wong
We inspect the pattern distribution on a design layer and find that different sub-regions have different pattern complexity.